Heat of adsorption and thin film surface area studies of a silica sol-gel film exposed to HCl and H{sub 2}O

Journal Article · Thu Nov 30 23:00:00 EST 1995 · Langmuir

DOI:https://doi.org/10.1021/la00012a034· OSTI ID:223612

Pfeifer, K B ^[1]

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1. Sandia National Labs., Albuquerque, NM (United States)

Heat of adsorption and surface area studies have been undertaken for H{sub 2}O and HCl adsorbing on a Stoeber sol-gel film coated on a surface acoustic wave (SAW) device. Adsorption isotherms measured with the SAW device are compared to the adsorption model of Brunauer, Emmett, and Teller (BET). The heat of adsorption for the first monolayer of H{sub 2}O and HCl was found to be 14.6 and 5.3 kcal/mol, respectively. The surface area of the film was also determined using the BET model. Results are compared to surface areas calculated from the film thickness and particle size. 50 refs., 5 figs.

• Research Organization: Sandia National Laboratory
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 223612
• Journal Information: Langmuir, Journal Name: Langmuir Journal Issue: 12 Vol. 11; ISSN 0743-7463; ISSN LANGD5
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
99 GENERAL AND MISCELLANEOUS
ADSORPTION
CALCULATION METHODS
GELS
HYDROCHLORIC ACID
MATHEMATICAL MODELS
SILICA
SOLS
SURFACE PROPERTIES
THERMODYNAMIC PROPERTIES
THIN FILMS
WATER