The growth and characterization of HgTe and HgCdTe using methylalylltelluride
Journal Article
·
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
- Electrical, Computer, Troy, New York 12180 (USA) Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, New York 12180 (US)
HgTe and HgCdTe layers have been grown by organometallic vapor phase epitaxy at low temperature by using methylallyltelluride (MATe), dimethylcadmium (DMCd) and elemental mercury. Use of MATe enabled the growth of layers in the 250--320 {degree}C range, which is 50 {degree}C lower than the growth temperature when diisopropyltelluride (DIPTe) is used, for the same growth rate. The layers were characterized by double crystal x-ray diffraction, Fourier-transform infrared (FTIR) spectroscopy, and by low temperature Hall measurements. Growth below 340 {degree}C resulted in featureless HgTe layers. HgTe layers, grown on CdTe, are misoriented with respect to the substrate by about 60--150 arc s. This tilting was not observed when CdZnTe substrates, to which there is a better lattice match, were used. The high quality of low temperature grown HgTe is demonstrated by the very narrow (27 arc s) full width at half-maximum (FWHM) of x-ray diffraction for layers grown on CdZnTe substrates. HgCdTe layers, grown at 320 {degree}C, showed well resolved interference fringes even for thin layers indicating the presence of an abrupt interface with the substrate. As grown layers were {ital n}-type, with the best mobility of 40 000 cm{sup 2} /V s at 40 K for a layer with composition {ital x} of 0.23.
- OSTI ID:
- 6860741
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:2; ISSN 0734-2101; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360603* -- Materials-- Properties
CADMIUM COMPOUNDS
CADMIUM TELLURIDES
CHALCOGENIDES
CHEMICAL REACTIONS
CONTROL
DIFFRACTION METHODS
EPITAXY
FABRICATION
HALL EFFECT
MEASURING METHODS
MERCURY COMPOUNDS
MERCURY TELLURIDES
PRESSURE CONTROL
SUBSTRATES
TELLURIDES
TELLURIUM COMPOUNDS
TEMPERATURE CONTROL
VAPOR PHASE EPITAXY
360603* -- Materials-- Properties
CADMIUM COMPOUNDS
CADMIUM TELLURIDES
CHALCOGENIDES
CHEMICAL REACTIONS
CONTROL
DIFFRACTION METHODS
EPITAXY
FABRICATION
HALL EFFECT
MEASURING METHODS
MERCURY COMPOUNDS
MERCURY TELLURIDES
PRESSURE CONTROL
SUBSTRATES
TELLURIDES
TELLURIUM COMPOUNDS
TEMPERATURE CONTROL
VAPOR PHASE EPITAXY