Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Carrier-induced change in refractive index of InP, GaAs, and InGaAsP

Journal Article · · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/3.44924· OSTI ID:6860566
 [1];  [2];  [3]
  1. Dept. of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA (US)
  2. Solid State Sciences Directorate, Rome Air Development Center, Hanscom Air Force Base, Bedford, MA (US)
  3. Dept. of Electrical Engineering and Computer Science, Massachussets Institute of Technology, Cambridge, MA (US)
The authors have theoretically estimated the change in refractive index {Delta}{ital n} produced by injection of free carriers in InP, GaAs, and InGaAsP. Bandfilling (Burstein-Moss effect), band-gap shrinkage, and free-carrier absorption (plasma effect) were included. Carrier concentrations of 10{sup 16}/cm{sup 3} to 10{sup 19}/cm{sup 3} and photon energies of 0.8 to 2.0 eV were considered. Predictions of {Delta}{ital n} are in reasonably good agreement with the limited experimental data available. Refractive index changes as large as 10{sup {minus} 2} are predicted for carrier concentrations of 10{sup 18}/cm{sup 3}, suggesting that low-loss optical phase modulators and switches using carrier injection are feasible in these materials.
OSTI ID:
6860566
Journal Information:
IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (USA) Vol. 26:1; ISSN 0018-9197; ISSN IEJQA
Country of Publication:
United States
Language:
English