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Characterization of silica- and alumina-supported vanadia catalysts using temperature programmed reduction

Journal Article · · Journal of Catalysis; (United States)
Supported and bulk vanadia catalysts are important catalysts for the partial oxidation of hydrocarbons. The nature of the vanadia-support interaction for silica and alumina-supported V[sub 2]O[sub 5] catalysts was investigated using temperature programmed reduction (TPR), temperature programmed oxidation, and solid-state [sup 51]V NMR. Solid-state [sup 51]V NMR for the V[sub 2]O[sub 5]/SiO[sub 2] catalysts indicated the presence of microcrystalline bulk-like vanadia species even at low vanadia loadings. Temperature programmed reduction of V[sub 2]O[sub 5]/SiO[sub 2] exhibited multiple peaks. It is suggested that the low temperature peak is due to reduction of surface vanadia. This appears to be the case also for bulk V[sub 2]O[sub 5]. [sup 51]V NMR indicated that bulk-like vanadia species are present for V[sub 2]O[sub 5]/Al[sub 2]O[sub 3] catalysts only at high vanadia loadings. Vanadia was more highly dispersed on alumina than on silica as evidenced by NMR and TPR. The two lowest temperature TPR peaks appear to be related to the reduction of surface vanadia on V[sub 2]O[sub 5]/Al[sub 2]O[sub 3]. It was found that for V[sub 2]O[sub 5]/Al[sub 2]O[sub 3] the average oxidation state of V after reduction to 900[degrees]C is consistent with the stoichiometry V[sup +5] [yields] V[sup +4], whereas the V[sub 2]O[sub 5]/SiO[sub 2] catalysts exhibited 70% reduction of the V[sub 2]O[sub 5] to V[sub 2]O[sub 3] as did bulk V[sub 2]O[sub 5]. The amount of surface vanadium as determined by TPR correlates reasonably to the amount of tetrahedral V found by NMR. It is concluded that TPR provides an excellent means by which vanadia dispersion can be estimated on supported vanadia catalysts. 32 refs., 5 figs., 6 tabs.
OSTI ID:
6858908
Journal Information:
Journal of Catalysis; (United States), Journal Name: Journal of Catalysis; (United States) Vol. 148:1; ISSN 0021-9517; ISSN JCTLA5
Country of Publication:
United States
Language:
English