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Title: Passivation of deep level states caused by misfit dislocations in InGaAs on patterned GaAs

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.108697· OSTI ID:6856451
; ;  [1]; ;  [2]
  1. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States)
  2. Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)

Deep level transient spectroscopy (DLTS) and cathodoluminescence (CL) were used to study the hydrogen passivation of misfit dislocations in In[sub 0.06]Ga[sub 0.94]As/GaAs heterostructures. The CL observations indicate that hydrogen plasma exposure passivates most, but not all, of the dark line defects existing in the specimen prior to hydrogenation. The concentration of deep level defect states that cannot be passivated is below the detection limit of the DLTS instrument (approximately 4[times]10[sup 12] cm[sup [minus]3]). We find the passivation is stable after anneals at temperatures as high as 600 [degree]C, indicating that hydrogen passivation of misfit dislocations is at least as stable as that of the isolated point defect studied previously with DLTS [W. C. Dautremont-Smith, J. C. Nabity, V. Swaminathan, M. Stavola, J. Chevalier, C. W. Tu, and S. J. Pearton, Appl. Phys. Lett. [bold 49] 1098 (1986)].

DOE Contract Number:
FG02-86ER45278
OSTI ID:
6856451
Journal Information:
Applied Physics Letters; (United States), Vol. 62:12; ISSN 0003-6951
Country of Publication:
United States
Language:
English