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U.S. Department of Energy
Office of Scientific and Technical Information

Apparatus for distributing the head load to the first wall from the plasma in an othe-type high-energy plasma device

Patent ·
OSTI ID:6850243
This patent describes an apparatus for containing plasma in a high energy plasma device, the apparatus comprising: a confinement vessel having a wall defining a closed interior including a plasma path, the wall having an inside surface; a magnet system including first conductors disposed outside the vessel for generating a magnetic field extending inside the closed interior; an armature ring disposed inside the wall; means for supporting the ring for rotation in a plane extending transversely of the plasma path and for preventing substantial movement of the ring in the direction of the plasma path. The ring includes armature conductors extending at an angle to lines of force of the magnetic field; means for supplying direct current to the armature conductors; a protective coating carried by the ring and facing the plasma path to provide a first wall whereby the interaction of the magnetic field and the current in the armature conductors causes rotation of the armature ring to prevent damage to the wall due to localized heating.
Assignee:
GA Technologies, Inc., San Diego, CA
Patent Number(s):
US 4654182
OSTI ID:
6850243
Country of Publication:
United States
Language:
English