Electrochromic properties of tungsten trioxide thin films prepared by photochemical vapor deposition

Journal Article · Thu Sep 01 00:00:00 EDT 1994 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2055138· OSTI ID:6841536

Maruyama, Toshiro; Kanagawa, Tetsuya ^[1]

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1. Kyoto Univ. (Japan). Dept. of Chemical Engineering

Electrochromic tungsten trioxide thin films were prepared by a photochemical vapor deposition. The source material was tungsten carbonyl. A 6 W low pressure mercury lamp was used as a light source. Amorphous tungsten trioxide thin films were obtained at a substrate temperature of 200 C. The UV radiation enhances the oxidation of tungsten, in addition to the acceleration of the deposition of the films. Reduction and oxidation of the films in a 0.3M LiClO[sub 4] propylene carbonate solution resulted in desirable changes in optimal absorption. The bleaching time was short compared to the amorphous CVD film. Coulometry indicated that the coloration efficiency was 222 cm[sup 2]/C.

• OSTI ID: 6841536
• Journal Information: Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 141:9; ISSN JESOAN; ISSN 0013-4651
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360606* -- Other Materials-- Physical Properties-- (1992-)
CARBONYLS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
ELECTRO-OPTICAL EFFECTS
ELECTROCHROMISM
ELECTROMAGNETIC RADIATION
EXPERIMENTAL DATA
INFORMATION
NUMERICAL DATA
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHYSICAL PROPERTIES
RADIATIONS
REFRACTORY METAL COMPOUNDS
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
TUNGSTEN OXIDES
ULTRAVIOLET RADIATION