Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Magnetic and structural properties of CoCrTa films and multilayers with Cr

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.344808· OSTI ID:6838259
;  [1];  [2]
  1. Behlen Laboratory of Physics, University ofNebraska, Lincoln, NE (USA) Center for Materials Research and Analysis, University of Nebraska, Lincoln, Nebraska 68588-0111 (USA)
  2. Imprimis/CDC, Minneapolis, Minnesota 55435 (USA)

We report our studies of epitaxial growth of CoCrTa films on Cr underlayers and the properties of CoCrTa/Cr multilayers. The coercivity, {ital H}{sub {ital c}}, strongly depends on Ta composition, sputtering conditions, and the thicknesses of the magnetic layer and Cr underlayer. An {ital H}{sub {ital c}} value of 1300 Oe was obtained for a Ta composition of 2 at. %, a Cr underlayer thickness of 4000 A, and a magnetic layer thickness of 400 A. The x-ray data show that the high {ital H}{sub {ital c}} occurs when crystallites of the Cr underlayer and CoCrTa layer are aligned with the Cr (200) and CoCrTa (110) planes in the film plane. Thus, the {ital c} axis of the CoCrTa lies essentially in the plane of the film. When the thickness of the magnetic layer increases above 1000 A the {ital c} axis begins to tip out of the film plane. The basal plane lattice parameter varies roughly linearly with Ta content up to 13 at. %. For the CoCrTa/Cr multilayered films, {ital H}{sub {ital c}} values up to 1200 Oe were obtained although the {ital c}-axis orientation of the magnetic layer becomes somewhat dispersed. Models for the dependence of magnetization reversal on microstructure are discussed.

OSTI ID:
6838259
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:9; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English