Tantalum etching in fluorocarbon/oxygen rf glow discharges
Journal Article
·
· Journal of Applied Physics; (USA)
- Department of Chemical Engineering, 201 Gilman Hall, University of California, Berkeley, California 94720 (USA)
- Materials Science, MS E549, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (USA) Technology Division, MS E549, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (USA)
Etch rates of tantalum in tetrafluoromethane-oxygen and hexafluoroethane-oxygen rf glow discharges were measured {ital in} {ital situ} as functions of pressure, reactor residence time, temperature, and applied plasma power. A dramatic increase in the etch rate was observed as the pressure increased. In addition, two distinct temperature regimes occurred in Arrhenius plots. Such data suggest strong effects due to heat of reaction in the Ta/CF{sub 4}-O{sub 2} etch system. The observed etch-rate pressure dependence can be explained by assuming first-order kinetics for the reaction of fluorine atoms with tantalum. Evidence for etch-rate quenching at high pressures due to an increase in the deposition of an inhibiting fluorocarbon surface layer is presented.
- OSTI ID:
- 6835511
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:8; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
CARBON TETRAFLUORIDE
DISPERSIONS
ELECTRIC DISCHARGES
ELEMENTS
ENTHALPY
ETCHING
FLUORINATED ALIPHATIC HYDROCARBONS
GLOW DISCHARGES
HALOGENATED ALIPHATIC HYDROCARBONS
METALS
MIXTURES
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXYGEN
PHYSICAL PROPERTIES
PLASMA
POWER
PRESSURE DEPENDENCE
REACTION HEAT
SURFACE FINISHING
TANTALUM
TEMPERATURE DEPENDENCE
THERMODYNAMIC PROPERTIES
TIME DEPENDENCE
TRANSITION ELEMENTS
400201* -- Chemical & Physicochemical Properties
CARBON TETRAFLUORIDE
DISPERSIONS
ELECTRIC DISCHARGES
ELEMENTS
ENTHALPY
ETCHING
FLUORINATED ALIPHATIC HYDROCARBONS
GLOW DISCHARGES
HALOGENATED ALIPHATIC HYDROCARBONS
METALS
MIXTURES
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXYGEN
PHYSICAL PROPERTIES
PLASMA
POWER
PRESSURE DEPENDENCE
REACTION HEAT
SURFACE FINISHING
TANTALUM
TEMPERATURE DEPENDENCE
THERMODYNAMIC PROPERTIES
TIME DEPENDENCE
TRANSITION ELEMENTS