Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Changes in the electrophysical characteristics of n-type silicon as a result of irradiation with 6. 3 MeV protons

Journal Article · · Sov. Phys. - Semicond. (Engl. Transl.); (United States)
OSTI ID:6830625
An analysis was made of the experimental dose dependences of the changes in the electrical conductivity and Hall mobility of carriers at T = 300 K in samples with different amounts of oxygen and phosphorus. The data for the annealed E centers indicated that an increase in the radiation dose reduced the hole mobility and the band gap of silicon, irrespective of their dependences on the impurity concentration and on the carrier density. On the other hand, the change in the electron mobility was governed by the degree of compensation of the material. It was also established that a reduction in the volume-average density of conduction electrons was due to accumulation of mainly isolated divacancies. The resultant limiting position of the Fermi level approx.E/sub v/+0.4 eV corresponded to the presence of a donor level E/sub v/+0.27 eV and a lower acceptor level E/sub c/-0.54 eV of a divacancy. An analysis of the experimental data obtained before annealing of the radiation defects indicated the presence not only of divacancies, but also of weakly separated (from divacancies) intrinsic interstitial defects which were annealed at temperatures T< or approx. =400 K and had deep acceptor and donor levels.
Research Organization:
Scientific-Research Institute of Nuclear Physics at the M. V. Lomonosov State University, Moscow
OSTI ID:
6830625
Journal Information:
Sov. Phys. - Semicond. (Engl. Transl.); (United States), Journal Name: Sov. Phys. - Semicond. (Engl. Transl.); (United States) Vol. 18:2; ISSN SPSEA
Country of Publication:
United States
Language:
English