Design of a large-scale plasma source ion implantation experiment
In Plasma Source Ion Implantation (PSII), a target to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Ions in the plasma are accelerated toward the target and implanted in its surface, thereby modifying the properties of the surface. Experimental results reported in the literature have generally been for small targets. We present here the design of a large-scale PSII experiment under construction at Los Alamo's National Laboratory, in which we plan to implant targets with surface areas of 1--2 m[sup 2] to doses of up to 5 [times] 10[sup 17] cm[sup [minus]2]. In presenting this design, we use Monte Carlo and particle-in-cell simulations to examine sheath expansion, implant current and dose, secondary electron emission, target sputtering, implant depth, and x-ray emission resulting from secondary electrons hitting the vacuum chamber wall.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- DOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 6828436
- Report Number(s):
- LA-UR-92-4141; CONF-921101--33; ON: DE93005438
- Country of Publication:
- United States
- Language:
- English
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Initial operation of a large-scale Plasma Source Ion Implantation experiment
Initial operation of a large-scale plasma source ion implantation experiment
Related Subjects
360106* -- Metals & Alloys-- Radiation Effects
42 ENGINEERING
420200 -- Engineering-- Facilities
Equipment
& Techniques
CALCULATION METHODS
CURRENTS
DESIGN
DOSES
ELECTRIC CURRENTS
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
EMISSION
EQUIPMENT
HARDENING
HIGH-FREQUENCY DISCHARGES
ION IMPLANTATION
IONIZING RADIATIONS
LABORATORY EQUIPMENT
MONTE CARLO METHOD
PHYSICAL RADIATION EFFECTS
PLASMA
PLASMA PRODUCTION
PULSES
PUMPS
RADIATION DOSES
RADIATION EFFECTS
RADIATIONS
SECONDARY EMISSION
SPUTTERING
TURBOMOLECULAR PUMPS
USES
VACUUM PUMPS
VACUUM SYSTEMS
X RADIATION