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Title: Initial operation of a large-scale Plasma Source Ion Implantation experiment

Abstract

In Plasma Source Ion Implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. Experimental PSII results reported in the literature have been for small workpieces. A large scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m{sup 2} have been implanted in a 1.5 m-diameter, 4.6 m-length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 {mu}s pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1,000 W, 13.56 MHz capacitively-coupled source produces nitrogen plasma densities in the 10{sup 15} m{sup {minus}3} range at neutral pressures as low as 0.02 mtorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 gauss. Measurements of sheath expansion, modulator voltage and current, and plasma density fill-in following a pulse are presented. The authors consider secondary electron emission, x-ray production, workpiece arcing, implant conformality,more » and workpiece and chamber heating.« less

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Los Alamos National Lab., NM (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
10188586
Report Number(s):
LA-UR-93-3216; CONF-9308156-2
ON: DE94000805; TRN: 93:003840
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Conference
Resource Relation:
Conference: Workshop on plasma-based ion implantation,Madison, WI (United States),4-6 Aug 1993; Other Information: PBD: [1993]
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; MATERIALS; ION IMPLANTATION; SURFACE TREATMENTS; NITROGEN; PLASMA; HARDNESS; FRICTION; WEAR RESISTANCE; CORROSION RESISTANCE; 360101; 360201; 360601; PREPARATION AND FABRICATION; PREPARATION AND MANUFACTURE

Citation Formats

Wood, B P, Henins, I, Gribble, R J, Reass, W A, Faehl, R J, Nastasi, M A, and Rej, D J. Initial operation of a large-scale Plasma Source Ion Implantation experiment. United States: N. p., 1993. Web.
Wood, B P, Henins, I, Gribble, R J, Reass, W A, Faehl, R J, Nastasi, M A, & Rej, D J. Initial operation of a large-scale Plasma Source Ion Implantation experiment. United States.
Wood, B P, Henins, I, Gribble, R J, Reass, W A, Faehl, R J, Nastasi, M A, and Rej, D J. Fri . "Initial operation of a large-scale Plasma Source Ion Implantation experiment". United States. https://www.osti.gov/servlets/purl/10188586.
@article{osti_10188586,
title = {Initial operation of a large-scale Plasma Source Ion Implantation experiment},
author = {Wood, B P and Henins, I and Gribble, R J and Reass, W A and Faehl, R J and Nastasi, M A and Rej, D J},
abstractNote = {In Plasma Source Ion Implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. Experimental PSII results reported in the literature have been for small workpieces. A large scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m{sup 2} have been implanted in a 1.5 m-diameter, 4.6 m-length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 {mu}s pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1,000 W, 13.56 MHz capacitively-coupled source produces nitrogen plasma densities in the 10{sup 15} m{sup {minus}3} range at neutral pressures as low as 0.02 mtorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 gauss. Measurements of sheath expansion, modulator voltage and current, and plasma density fill-in following a pulse are presented. The authors consider secondary electron emission, x-ray production, workpiece arcing, implant conformality, and workpiece and chamber heating.},
doi = {},
url = {https://www.osti.gov/biblio/10188586}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {10}
}

Conference:
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