Recent results from a large-scale plasma source ion implantation experiment
- Los Alamos National Lab., NM (United States)
In Plasma Source Ion Implantation (PSII), a target to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Ions in the plasma are accelerated toward the target and implanted in its surface, thereby modifying the properties of the surface. A large-scale PSII facility is in operation at Los Alamos, in which objects with areas larger than 4 m{sup 2} have been implanted. Implantation is performed in a 4.6 m-long, 1.5 m-diameter cylindrical vacuum chamber, and driven by a high-voltage pulse modulator capable of producing 50 A peak current pulses of 20 {mu}s duration at a frequency of 2 kHz. Recent work has centered around a power supply upgrade to allow implants at over 100 kV, and expansion of their repertoire of plasmas to include methane, cetylene, oxygen, and ammonia, in addition to nitrogen and argon. This talk will cover interesting problems encountered in operating at these higher voltages and new gases, and cover target fixturing issues in vacuum chambers of this large size.
- OSTI ID:
- 42985
- Report Number(s):
- CONF-940604--; ISBN 0-7803-2006-9
- Country of Publication:
- United States
- Language:
- English
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