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Dependence of magnetostriction of sputtered Tb-Fe films on preparation conditions

Conference · · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6822577
; ; ;  [1];  [2]
  1. Tohoku Univ., Sendai (Japan). Research Institute of Electrical Communication
  2. Tokin Corp., Sendai (Japan). Sendai Research Lab.
Amorphous Tb-Fe thin films prepared by sputtering method in the compositional range Tb[sub x]Fe[sub 1[minus]x] (x = 0--0.5) have been investigated in view of their potential for use in electromagnetic thin film actuators. The authors examined the magnetostriction and the coercive force for the Tb-Fe films for different sputtering conditions to obtain both soft magnetic properties 2nd large magnetostriction in this system. As a result, they obtained Tb-Fe thin films having large magnetostrictions (180[times]10[sup [minus]6] at 1kOe) and low coercive force (60--70 Oe). These films were prepared under the conditions of the composition of 45--50at%Tb, Ar gas pressure of 4mTorr, rf input power of 200W and using water cooled substrates. A trial actuator using magnetostrictive thin films is also reported.
OSTI ID:
6822577
Report Number(s):
CONF-930416--
Conference Information:
Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 29:6Pt1
Country of Publication:
United States
Language:
English

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