Properties of W--N and Mo--N films prepared by reactive sputtering

Journal Article · Tue May 01 04:00:00 EDT 1990 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.576882· OSTI ID:6821139

Shih, K K; Dove, D B ^[1]

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1. IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY (USA)

The structure and properties of W--N films up to 22 {mu}m thick prepared by a reactive dc magnetron sputtering process are reported. It has been found that the properties of the deposited films not only depend on the nitrogen partial pressure in the argon--nitrogen gas mixtures but also on total gas pressure and input power during sputtering. The rate of deposition decreased with increase of nitrogen partial pressure, but was higher at higher total pressure and input power. The resistivity increased with nitrogen partial pressure but was lower at lower total gas pressure and higher input power. The hardness of W--N films could be varied from 600 to 3000 kg/mm{sup 2} depending on sputtering conditions. The hardness, in general, increased with nitrogen partial pressure with higher value at higher total pressure and input power. X-ray diffraction did not indicate presence of nitride phases when the content of nitrogen in the argon--nitrogen gas mixtures during sputtering was below 10%, and the total gas pressure was {lt}40 mTorr. W{sub 2}N was observed when the nitrogen content was over 30% and also when the nitrogen content was over 10% and total gas pressure was over 40 mTorr. These results are consistent with composition determined by the microprobe measurements. Similar studies on Mo--N films made by dc and rf magnetron reactive sputtering methods are reported. Hardness values for the Mo--N films of more than 2200 kg/mm{sup 2} have been observed.

• OSTI ID: 6821139
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:3; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360103* -- Metals & Alloys-- Mechanical Properties
360104 -- Metals & Alloys-- Physical Properties
CATHODE SPUTTERING
COATINGS
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
HARDNESS
MAGNETRONS
MECHANICAL PROPERTIES
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MOLYBDENUM
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NONMETALS
PHYSICAL PROPERTIES
PNICTIDES
PRESSURE DEPENDENCE
SPUTTERING
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
VAPOR DEPOSITED COATINGS