Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

In situ growth of DyBa sub 2 Cu sub 3 O sub 7 minus x thin films by molecular beam epitaxy

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103225· OSTI ID:6815775
; ; ; ; ; ; ; ; ;  [1]
  1. Center for the Science and Application of Superconductivity, University of Minnesota, Minneapolis, Minnesota 55455 (USA)

Films of DyBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} with transition temperatures as high as 89 K and with nominal thicknesses down to 35 A have been grown {ital in} {ital situ} using molecular beam epitaxy employing ozone as a source of reactive oxygen. The process has been successful with a variety of substrates including SrTiO{sub 3}(100), SrTiO{sub 3}(110), LaAlO{sub 3}(100), MgO(100), and yttria-stabilized zirconia. The films could be imaged with a scanning tunneling microscope at 4.2 K, indicating a conducting surface even at low temperatures.

OSTI ID:
6815775
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:19; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English