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Natural buffer layer in DyBa sub 2 Cu sub 3 O sub 7 minus x films grown on Si by molecular beam epitaxy

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.350189· OSTI ID:5097416
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  1. Center for the Science and Application of Superconductivity and School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota (USA)

Growth of a natural buffer layer has been observed for DyBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films grown on Si substrates. The best DyBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} film, grown by molecular beam epitaxy with ozone as a source of activated oxygen, was 2300-A thick, highly {ital c}-axis oriented, and had a resistive-transition onset at 90 K and zero resistance by 70 K. The natural buffer layer, which grew at the interface of the DyBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} film and the Si substrate, consisted of Si, Ba, and O. Transmission electron microscopy on this film revealed a 150-A amorphous layer, whereas Auger electron spectroscopy depth profiling showed 400 A of chemical interdiffusion.

OSTI ID:
5097416
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 70:10; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English