Negative ion beam injection apparatus with magnetic shield and electron removal means

Patent · Tue Nov 15 00:00:00 EST 1994

OSTI ID:6808527

Anderson, O A; Chan, C F; Leung, K N

A negative ion source is constructed to produce H[sup [minus]] ions without using cesium. A high percentage of secondary electrons that typically accompany the extracted H[sup [minus]] are trapped and eliminated from the beam by permanent magnets in the initial stage of acceleration. Penetration of the magnetic field from the permanent magnets into the ion source is minimized. This reduces the destructive effect the magnetic field could have on negative ion production and extraction from the source. A beam expansion section in the extractor results in a strongly converged final beam. 16 figs.

• DOE Contract Number: AC03-76SF00098
• Assignee: Univ. of California, Oakland, CA (United States)
• Patent Number(s): US 5365070; A
• Application Number: PPN: US 7-875778
• OSTI ID: 6808527
• Resource Relation: Patent File Date: 29 Apr 1992
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
Ta
HYDROGEN IONS 1 MINUS
ION SOURCES
DESIGN
BEAM EXTRACTION
ION BEAM INJECTION
ANIONS
BEAM INJECTION
CHARGED PARTICLES
HYDROGEN IONS
IONS
661220* - Particle Beam Production & Handling
Targets- (1992-)