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Nucleation of high-T/sub c/ Nb/sub 3/Ge in the presence of impurities

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90337· OSTI ID:6807874
Analyses of high-T/sub c/ Nb/sub 3/Ge films show that they all have a peak in oxygen concentration near the substrate-film interface and that their lattice parameters in that region are abnormally large. It is proposed that high-T/sub c/ Nb/sub 3/Ge is a metastable phase which is formed via a homoepitaxial process from a large lattice parameter A15 Nb-Ge phase. This phase near the interface is believed stable due to an expanded lattice resulting from the presence of impurities.
Research Organization:
Westinghouse RandD Center, Pittsburgh, Pennsylvania 15235
OSTI ID:
6807874
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:4; ISSN APPLA
Country of Publication:
United States
Language:
English