Energy ordering of the excited states of XeF

Journal Article · Sat Jul 01 04:00:00 EDT 1978 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.90183· OSTI ID:6803736

Kligler, D; Nakano, H H; Huestis, D L; Bischel, W K; Hill, R M; Rhodes, C K

Ar/Xe/NF/sub 3/ mixtures were excited by the focused beam from an ArF (193 nm) laser. Xe/sup +/ ions are produced by two-photon ionization, the electrons attach to make F/sup -/, and the ions recombine to make XeF*. Radiation is observed in the XeF(B 1/2) ..-->..XeF(X 1/2) bands near 351 nm and in the broader XeF(C 3/2) ..-->..XeF(A 3/2) band near 460 nm. At low background gas pressure, mostly B-X uv emission is observed. As the argon pressure is increased to 1000 Torr, the visible/uv band intensity ratio increases to about 3 to 1. We conclude from these results that the C (3/2) state lies 700 +- 70 cm/sup -/1 below the B (1/2) state. This conclusion should have a significant impact on our understanding of the fluorescence yields and laser performance of e-beam-excited XeF.

• Research Organization: Molecular Physics Laboratory, SRI International, Menlo Park, California 94025
• OSTI ID: 6803736
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ARGON
CHARGED PARTICLES
ELECTRIC DISCHARGES
ELECTRON ATTACHMENT
ELEMENTS
EMISSION SPECTRA
ENERGY LEVELS
ENERGY-LEVEL TRANSITIONS
EXCITATION
EXCITED STATES
FLUORESCENCE
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
IONIZATION
IONS
LASERS
LUMINESCENCE
NITROGEN COMPOUNDS
NITROGEN FLUORIDES
NONMETALS
PERFORMANCE
PRESSURE DEPENDENCE
RARE GAS COMPOUNDS
RARE GASES
RECOMBINATION
SPECTRA
ULTRAVIOLET SPECTRA
XENON
XENON COMPOUNDS
XENON FLUORIDES
XENON IONS