Structural study of GaN grown on (001) GaAs by organometallic vapor phase epitaxy
- Kwangju Inst. of Science and Technology (Korea, Republic of). Dept. of Materials Science and Engineering
- Korea Inst. of Science and Technology, Seoul (Korea, Republic of). Semiconductor Materials Lab.
Detailed transmission electron microscope (TEM) and transmission electron diffraction (TED) examination has been performed on organometallic vapor phase epitaxial GaN layers grown on (001) GaAs substrate to investigate microstructures and phase stability, TED and TEM results exhibit the occurrence of a mixed phase of GaN. The wurtzite ({alpha}) phase grains are embedded in the zinc-blende ({beta}) phase matrix. It is shown that there are two types of the wurtzite GaN phase, namely, the epitaxial wurtzite and the tilted wurtzite. The tilted wurtzite grains are rotated some degrees ranging from {approximately}5{degree} to {approximately}35{degree} regarding the GaAs substrate. A simple model is presented to describe the occurrence of the mixed phases and the two types of the wurtzite phase.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 679207
- Journal Information:
- Journal of Electronic Materials, Journal Name: Journal of Electronic Materials Journal Issue: 7 Vol. 28; ISSN JECMA5; ISSN 0361-5235
- Country of Publication:
- United States
- Language:
- English
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