Study of reactive plasma deposited thin films. Semiannual progress report
Technical Report
·
OSTI ID:6775638
A state-of-the-art research laboratory was established to grow and characterize amorphous thin films that are useful in semi-conductor devices. Two film systems, nitride films and silicon dioxide films were studied. Over seventy deposition runs for nitride films were made. The films were deposited on silicon substrate using plasma enhanced chemical vapor deposition. It was found that the uniformity of the films were affected by the location of the film on the platen.
- Research Organization:
- North Carolina Agricultural and Technical State Univ., Greensboro (USA)
- OSTI ID:
- 6775638
- Report Number(s):
- N-87-14167; NASA-CR-179834; NAS-1.26:179834
- Country of Publication:
- United States
- Language:
- English
Similar Records
Cathodic cage plasma deposition of TiN and TiO{sub 2} thin films on silicon substrates
Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum
Reactive sputter-deposition of AlN films by dense plasma focus
Journal Article
·
Wed Jul 15 00:00:00 EDT 2015
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
·
OSTI ID:22392197
Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum
Journal Article
·
Sat Dec 31 23:00:00 EST 1994
· High Temperature
·
OSTI ID:79172
Reactive sputter-deposition of AlN films by dense plasma focus
Journal Article
·
Tue Nov 14 23:00:00 EST 2006
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
·
OSTI ID:20853800
Related Subjects
36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
AMORPHOUS STATE
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
DIMENSIONS
EXPERIMENTAL DATA
FILMS
HEATING
INFORMATION
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PLASMA HEATING
PNICTIDES
REFRACTIVITY
SEMICONDUCTOR DEVICES
SILICON COMPOUNDS
SILICON OXIDES
SURFACE COATING
THICKNESS
THIN FILMS
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
AMORPHOUS STATE
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
DIMENSIONS
EXPERIMENTAL DATA
FILMS
HEATING
INFORMATION
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PLASMA HEATING
PNICTIDES
REFRACTIVITY
SEMICONDUCTOR DEVICES
SILICON COMPOUNDS
SILICON OXIDES
SURFACE COATING
THICKNESS
THIN FILMS