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Title: X-ray photoelectron spectroscopy study of Schottky barrier formation and thermal stability of the LaB/sub 6//GaAs(001) c (4 x 4) interface

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98090· OSTI ID:6774519

Schottky barrier formation and thermal stability of the LaB/sub 6//GaAs(001) c (4 x 4) interface were investigated by x-ray photoelectron spectroscopy. Results show an excellent thermal stability without any appreciable interface reactions such as interdiffusion. Band bending induced by LaB/sub 6/ deposition is found to depend on the evaporation condition. However, the Fermi level pinning position does not change due to heat treatments between 300 and 700 /sup 0/C. This indicates that LaB/sub 6/ is a promising gate material for GaAs integrated circuits.

Research Organization:
Optoelectronics Joint Research Laboratory, 1333 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
OSTI ID:
6774519
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 50:10
Country of Publication:
United States
Language:
English