Grain orientation mapping of passivated aluminum interconnect wires with X-ray micro-diffraction
- Lawrence Berkeley National Lab., CA (United States)
- Lawrence Berkeley National Lab., CA (United States). Advanced Light Source Div.
A micro x-ray diffraction facility is under development at the Advanced Light source. Spot sizes are typically about 1-{micro}m size generated by means of grazing incidence Kirkpatrick-Baez focusing mirrors. Photon energy is either white of energy range 6--14 keV or monochromatic generated from a pair of channel cut crystals. A Laue diffraction pattern from a single grain in passivated 2-{micro}m wide bamboo structured Aluminum interconnect line has been recorded. Acquisition times are of the order of a few seconds. The Laue pattern has allowed the determination of the crystallographic orientation of individual grains along the line length. The experimental and analysis procedures used are described, as is a grain orientation result. The future direction of this program is discussed in the context of strain measurements in the area of electromigration.
- Research Organization:
- Lawrence Berkeley National Lab., Advanced Light Source Div., Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 677095
- Report Number(s):
- LBNL-42053; LSBL-477; CONF-980405-; ON: DE98059381; TRN: 99:000827
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society, San Francisco, CA (United States), 13-17 Apr 1998; Other Information: PBD: Jun 1998
- Country of Publication:
- United States
- Language:
- English
Similar Records
Grain orientation mapping of passivated aluminum interconnect lines by x-ray micro-diffraction
Grain orientation mapping of passivated aluminum interconnect lines by x-ray micro-diffraction