133rd meeting of the Electrochemical Society, abstracts
The following topics were dealt with: theory of dielectric behavior; optical properties of dielectric films; photoresist; technology and applications; luminescent and laser materials; color television; semiconductor III-V compounds, SIC, amorphous and epitaxial SI; insulating films on SI; diffusion and implantation in SI; contacts to SI; preparation and properties of single crystals for acoustic, optical and microwave application; electron and ion beams physics; electron and ion beams in microelectronics; electron beams in materials processing; electron beam welding; adsorption phenomena on solids; secondary cells. 285 papers were presented, of which all are published as abstracts only. Individual papers within the subject scope of this journal will be abstracted in this or a subsequent issue.
- OSTI ID:
- 6766852
- Report Number(s):
- CONF-680579-
- Country of Publication:
- United States
- Language:
- English
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