Electron beam induced damage in PECVD Si sub 3 N sub 4 and SiO sub 2 films on InP
Conference
·
OSTI ID:6753457
Phosphorus rich plasma enhanced chemical vapor deposition (PECVD) of silicon nitride and silicon dioxide films on n-type indium phosphide (InP) substrates were exposed to electron beam irradiation in the 5 to 40 keV range for the purpose of characterizing the damage induced in the dielectic. The electron beam exposure was on the range of 10{sup {minus}7} to 10{sup {minus}3} C/sq cm. The damage to the devices was characterized by capacitance-voltage (C-V) measurements of the metal insulator semiconductor (MIS) capacitors. These results were compared to results obtained for radiation damage of thermal silicon dioxide on silicon (Si) MOS capacitors with similar exposures. The radiation induced damage in the PECVD silicon nitride films on InP was successfully annealed out in an hydrogen/nitrogen (H2/N2) ambient at 400 C for 15 min. The PECVD silicon dioxide films on InP had the least radiation damage, while the thermal silicon dioxide films on Si had the most radiation damage.
- Research Organization:
- National Aeronautics and Space Administration, Cleveland, OH (USA). Lewis Research Center
- OSTI ID:
- 6753457
- Report Number(s):
- N-90-20393; NASA-TM--102544; E--5356; NAS--1.15:102544; CONF-8710376--
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360206* -- Ceramics
Cermets
& Refractories-- Radiation Effects
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
ELECTRON BEAMS
ELEMENTS
EXPERIMENTAL DATA
FILMS
INDIUM COMPOUNDS
INDIUM PHOSPHIDES
INFORMATION
LEPTON BEAMS
MINERALS
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
PHOSPHIDES
PHOSPHORUS COMPOUNDS
PHYSICAL RADIATION EFFECTS
PNICTIDES
RADIATION EFFECTS
SEMIMETALS
SILICA
SILICON
SILICON COMPOUNDS
SILICON NITRIDES
SILICON OXIDES
SURFACE COATING
THIN FILMS
360206* -- Ceramics
Cermets
& Refractories-- Radiation Effects
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
ELECTRON BEAMS
ELEMENTS
EXPERIMENTAL DATA
FILMS
INDIUM COMPOUNDS
INDIUM PHOSPHIDES
INFORMATION
LEPTON BEAMS
MINERALS
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
PHOSPHIDES
PHOSPHORUS COMPOUNDS
PHYSICAL RADIATION EFFECTS
PNICTIDES
RADIATION EFFECTS
SEMIMETALS
SILICA
SILICON
SILICON COMPOUNDS
SILICON NITRIDES
SILICON OXIDES
SURFACE COATING
THIN FILMS