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Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films

Journal Article · · Applied Optics
; ;  [1]; ;  [2]
  1. Department of Materials Science, The ngstroem Laboratory, Uppsala University, P.O. Box 534, S-751 21 Uppsala (Sweden)
  2. Lawrence Berkeley National Laboratory, University of California at Berkeley, Berkeley, California 94720 (United States)
Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive dc magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both techniques being firmly connected to stoichiometric information. The optical constants {ital n} and {ital k} were evaluated from spectrophotometry and from variable-angle spectroscopic ellipsometry. The two analyses gave consistent results. It was found that {ital n} for the mixed-oxide films varied smoothly between the values for the pure oxides, whereas {ital k} in the band-gap range showed characteristic differences between Ti-Ce oxide and Zr-Ce oxide. It is speculated that this difference is associated with structural effects. {copyright} 1998 Optical Society of America
Research Organization:
Lawrence Berkeley National Laboratory
DOE Contract Number:
AC03-76SF00098
OSTI ID:
675099
Journal Information:
Applied Optics, Journal Name: Applied Optics Journal Issue: 25 Vol. 37; ISSN 0003-6935; ISSN APOPAI
Country of Publication:
United States
Language:
English

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