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Ion-beam mixing of Ni/Pd layers: I. Cascade mixing regime (low temperature)

Journal Article · · J. Mat. Res.; (United States)
Atomic mixing resulting from heavy-ion bombardment of thin-film Ni/Pd bilayers and thin Pd markers sandwiched between Ni layers has been investigated. Mixing experiments were performed over a temperature range 40--473 K, using 120 keV Ar/sup +/ and 145 keV Kr/sup +/ ions at a constant dose rate of 5.5 x 10/sup 12/ ions cm/sup -2/ s/sup -1/ for doses up to 4 x 10/sup 16/ cm/sup -2/. The resulting interdiffusion was measured, in situ, using Rutherford backscattering with 2--2.8 MeV /sup 4/He/sup +/ ions. The results showed that, for both markers and bilayers, the amount of mixing is similar for both configurations and, varies linearly with the square root of the ion dose. Comparison of the induced mixing per ion, following irradiation at 40 K, shows that the mixing is dependent on the damage energy F/sub D/ deposited at the interface region. The mixing is essentially athermal.
Research Organization:
Department of Engineering Physics and Institute for Materials Research, McMaster University, Hamilton, Ontario L8S 4M1, Canada
OSTI ID:
6747217
Journal Information:
J. Mat. Res.; (United States), Journal Name: J. Mat. Res.; (United States) Vol. 3:6; ISSN JMREE
Country of Publication:
United States
Language:
English