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Long lifetime silicon photoconductive semiconductor switches

Conference ·
OSTI ID:6732303
; ; ; ; ; ; ; ;  [1];  [2];  [3]
  1. Sandia National Labs., Albuquerque, NM (United States)
  2. David Sarnoff Research Center, Princeton, NJ (United States)
  3. Grumman Corp., Bethpage, NY (United States). Corporate Technology
We present the results of experiments aimed at improving the lifetime (longevity) of Si photoconductive semiconductor switches (PCSS) . Because damage at the metal-semiconductor interface is the primary damage mechanism in most PCSS, we have tested different contact metallizations. The test setup utilizes: a ND:YAG laser that operates at 540 Hz with 50 NJ, 10 ns FWHM pulses; a circuit that charges a 50 a line in800 ns and discharges it in 20 ns through a 50 a load; and a lateral switch geometry and 0.25 cm by 0.25 cm switches. The contacts examined include: Cr(diffused)-Cr-Mo-Au, Al(diffused)-Cr-Mo-Au, [sup 31]p (ion implanted)-Ti-Pt, Al(diffused)Pt-Ti-Pd-Au, and edge contacts. In the case of the Cr contacts we have tried thicker Mo or Au layers. For the Al contacts we have tried 1 [mu]m and 0.1 pm thick depositions. Most contacts survived 10[sup 7] pulses when switching 32 kv/cm (8 kV over 0.25 cm). The Al diffused went up to 44 kv/cm (1 [times] 10[sup 5] pulses). The implanted P switch was switched 2.2 [times] 10[sup 7] times at 44 kv/cm and 0.9 [times] 10[sup 6] times at 48 kv/cm.
Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
DOE; DOD; USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6732303
Report Number(s):
SAND-92-1202C; CONF-930159--13; ON: DE93006757; CNN: F29601-91-C0046
Country of Publication:
United States
Language:
English