Long lifetime silicon photoconductive semiconductor switches
Conference
·
OSTI ID:10133253
- Sandia National Labs., Albuquerque, NM (United States)
- David Sarnoff Research Center, Princeton, NJ (United States)
- Grumman Corp., Bethpage, NY (United States). Corporate Technology
We present the results of experiments aimed at improving the lifetime (longevity) of Si photoconductive semiconductor switches (PCSS) . Because damage at the metal-semiconductor interface is the primary damage mechanism in most PCSS, we have tested different contact metallizations. The test setup utilizes: a ND:YAG laser that operates at 540 Hz with 50 NJ, 10 ns FWHM pulses; a circuit that charges a 50 a line in800 ns and discharges it in 20 ns through a 50 a load; and a lateral switch geometry and 0.25 cm by 0.25 cm switches. The contacts examined include: Cr(diffused)-Cr-Mo-Au, Al(diffused)-Cr-Mo-Au, {sup 31}p (ion implanted)-Ti-Pt, Al(diffused)Pt-Ti-Pd-Au, and edge contacts. In the case of the Cr contacts we have tried thicker Mo or Au layers. For the Al contacts we have tried 1 {mu}m and 0.1 pm thick depositions. Most contacts survived 10{sup 7} pulses when switching 32 kv/cm (8 kV over 0.25 cm). The Al diffused went up to 44 kv/cm (1 {times} 10{sup 5} pulses). The implanted P switch was switched 2.2 {times} 10{sup 7} times at 44 kv/cm and 0.9 {times} 10{sup 6} times at 48 kv/cm.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 10133253
- Report Number(s):
- SAND--92-1202C; CONF-930159--13; ON: DE93006757; CNN: Contract F29601-91-C0046
- Country of Publication:
- United States
- Language:
- English
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