Perpendicular anisotropy of bias modulated ErCo sputtered films

Journal Article · Mon Nov 14 23:00:00 EST 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.342339· OSTI ID:6728931

Nawate, M; Tsunashima, S; Uchiyama, S

Perpendicular anisotropy in bias modulated ErCo sputtered films has been investigated. A ErCo single layer film with or without substrate bias has in-plane magnetization, while a multilayered film formed by the bias modulation has perpendicular magnetization when the modulation period is in the range of 30--60 A. The perpendicular anisotropy is thought to originate in the interface and the value of interface anisotropy K/sub s/ is estimated to be 0.01--0.02 erg/cm/sup 2/.

• Research Organization: Department of Electrical Engineering, Nagoya University, Nagoya 464-01, Japan
• OSTI ID: 6728931
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:10; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
ALLOYS
COBALT ALLOYS
ERBIUM ALLOYS
INTERFACES
MAGNETIC PROPERTIES
MAGNETIZATION
MODULATION
PHYSICAL PROPERTIES
RARE EARTH ALLOYS
SPUTTERING