Enhancement of perpendicular anisotropy in amorphous GdCo and TbFe films prepared by alternative bias sputtering

Journal Article · Fri Apr 15 00:00:00 EDT 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.340842· OSTI ID:5280061

Yamamoto, H; Tanaka, M; Naoe, M

Amorphous GdCo and TbFe films were prepared by a newly devised sputtering technique in which film deposition and ion bombardments were performed alternatively. The changes of the film composition and magnetic properties were focused as a function of the thickness of the layer periodically deposited. It was found that ion bombardments induced by the substrate bias changed the composition only within a few atomic layers near the film surface. At the periodic thickness of about 3 nm, the enhancement of a perpendicular magnetic anisotropy took place in the both cases of GdCo and TbFe films. The new class of perpendicular anisotropy was discussed in relation to the multilayered structure formed by the alternative bias sputtering.

• Research Organization: College of Science and Technology, Nihon University, Funabashishi, Chiba 274, Japan
• OSTI ID: 5280061
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 63:8; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ALLOYS
ANISOTROPY
COBALT ALLOYS
COLLISIONS
DATA
DEPOSITION
ELEMENTS
ENERGY BEAM DEPOSITION
EXPERIMENTAL DATA
GADOLINIUM ALLOYS
INFORMATION
ION COLLISIONS
IRON ALLOYS
METALS
NUMERICAL DATA
RARE EARTH ALLOYS
SPUTTERING
SURFACE COATING
TERBIUM ALLOYS
TRANSITION ELEMENTS