Method for the production of atomic ion species from plasma ion sources
Patent
·
OSTI ID:672727
A technique to enhance the yield of atomic ion species (H{sup +}, D{sup +}, O{sup +}, N{sup +}, etc.) from plasma ion sources. The technique involves the addition of catalyzing agents to the ion discharge. Effective catalysts include H{sub 2}O, D{sub 2}O, O{sub 2}, and SF{sub 6}, among others, with the most effective being water (H{sub 2}O) and deuterated water (D{sub 2}O). This technique has been developed at Argonne National Laboratory, where microwave generated plasmas have produced ion beams comprised of close to 100% purity protons (H{sup +}) and close to 100% purity deuterons (D{sup +}). The technique also increases the total yield of protons and deuterons by converting unwanted ion species, namely, H{sub 2}{sup +}, H{sub 3}{sup +} and D{sub 2}{sup +}, D{sub 3}{sup +}, into the desired ion species, H{sup +} and D{sup +}, respectively. 4 figs.
- Research Organization:
- University of Chicago
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-31109-ENG-38
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- US 5,789,744/A/
- Application Number:
- PAN: 8-644,610
- OSTI ID:
- 672727
- Country of Publication:
- United States
- Language:
- English
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