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A study of the vaporization of indium trifluoride

Journal Article · · High Temperature and Materials Science
OSTI ID:672432
; ; ;  [1]
  1. Univ. La Sapienza, Roma (Italy). Dept. di Chimica
The temperature dependence of the vapor pressure of InF{sub 3}, measured by the torsion-effusion and Knudsen-effusion methods over the temperature range 1040--1249K, is represented by the selected linear equation: log p(kPa) = 11.10 {+-} 0.20-(16300 {+-} 300)/T(K). From second- and third-law treatment of the results, the standard sublimation enthalpy of this compound, {Delta}{sub sub}H{sub 298}{degree} = 330 {+-} 4 kJ mol{sup {minus}1}, was derived.
OSTI ID:
672432
Journal Information:
High Temperature and Materials Science, Journal Name: High Temperature and Materials Science Journal Issue: 2 Vol. 37; ISSN 1080-1278; ISSN HTMSFP
Country of Publication:
United States
Language:
English

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