Dielectric properties of rf-sputtered Y sub 2 O sub 3 thin films

Journal Article · Sun Jul 15 04:00:00 EDT 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.346804· OSTI ID:6720449

Onisawa, K; Fuyama, M; Tamura, K; Taguchi, K; Nakayama, T; Ono, Y A ^[1]

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1. Hitachi Research Laboratory, Hitachi, Ltd., 4026 Kuji-cho, Hitachi, Ibaraki 319-12 (Japan)

Yttrium oxide (Y{sub 2}O{sub 3}) thin films were deposited on indium-tin-oxide(ITO)-coated glass substrates by the radio-frequency-sputtering method using an Y{sub 2}O{sub 3}-sintered target. The relative dielectric constant {epsilon}{sub r} and the dielectric strength {ital E}{sub {ital BD}} of the Y{sub 2}O{sub 3} films were studied. It was found that {epsilon}{sub {ital r}} and E{sub {ital BD}} have a maximum value and a minimum value, respectively, at 1.3 Pa when the pressure of the sputtering gas, Ar+10% O{sub 2}, is varied from 0.67 to 9.3 Pa. The x-ray diffraction study showed that the Y{sub 2}O{sub 3} films deposited at 1.3 Pa are predominantly oriented along the {l angle}332{r angle} direction and their grain size is the smallest. Ion mass analysis showed impurity diffusion from ITO in the films deposited at 1.3 Pa. Furthermore, the dielectric properties of the Y{sub 2}O{sub 3} films deposited at 1.3 Pa are related to the structural properties, such as the {l angle}332{r angle} orientation, grain size, and impurity diffusion.

• OSTI ID: 6720449
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 68:2; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
CHALCOGENIDES
COHERENT SCATTERING
CRYSTAL STRUCTURE
DIELECTRIC PROPERTIES
DIFFRACTION
DIFFUSION
ELECTRICAL PROPERTIES
FILMS
GLASS
GRAIN SIZE
IMPURITIES
INDIUM COMPOUNDS
INDIUM OXIDES
MICROSTRUCTURE
ORIENTATION
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SCATTERING
SIZE
SPUTTERING
SUBSTRATES
THIN FILMS
TIN COMPOUNDS
TIN OXIDES
TRANSITION ELEMENT COMPOUNDS
X-RAY DIFFRACTION
YTTRIUM COMPOUNDS
YTTRIUM OXIDES