Growth and patterning of GaAs/Ge single crystal layers on Si substrates by molecular beam epitaxy
Journal Article
·
· Appl. Phys. Lett.; (United States)
Single crystal GaAs layers have been grown on Si substrates with an intermediate Ge layer. Both the Ge and subsequent GaAs are grown in situ by molecular beam epitaxy (MBE). Cross-sectional transmission electron microscopy studies show GaAs surface dislocation densities on the order of 10/sup 7/ cm/sup -2/. The quality of the GaAs is indicated by a mobility within 15% of that measured on GaAs/GaAs MBE structures doped at the same level. This material also exhibits a photoluminescence signal with a room-temperature intensity about 50% of GaAs grown on GaAs, and with a similar half-width. In this letter, electron diffraction, optical and electrical data are presented for n-type GaAs/Ge/Si structures. In addition, a selective lift-off technique is demonstrated, with possible applications in the development of monolithic GaAs/Si integrated circuits.
- Research Organization:
- Solar Energy Research Institute, Photovoltaic Devices and Measurements Branch, Golden, Colorado 80401
- DOE Contract Number:
- AC02-77CH00178
- OSTI ID:
- 6704583
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 45:3; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Growth and characterization of GaAs/Ge epilayers grown on Si substrates by molecular beam epitaxy
Growth and characterization of GaAs/Ge epilayers grown on Si substrates by molecular beam epitaxy
Selective patterning of single-crystal GaAs/Ge structures on Si substrates by molecular beam epitaxy
Journal Article
·
Sat Nov 30 23:00:00 EST 1985
· J. Appl. Phys.; (United States)
·
OSTI ID:6407339
Growth and characterization of GaAs/Ge epilayers grown on Si substrates by molecular beam epitaxy
Journal Article
·
Sat Nov 30 23:00:00 EST 1985
· J. Appl. Phys.; (United States)
·
OSTI ID:6392238
Selective patterning of single-crystal GaAs/Ge structures on Si substrates by molecular beam epitaxy
Journal Article
·
Wed May 01 00:00:00 EDT 1985
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:5625330
Related Subjects
36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
ARSENIC COMPOUNDS
ARSENIDES
COHERENT SCATTERING
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
DEPOSITION
DIFFRACTION
DISLOCATIONS
ELECTRICAL PROPERTIES
ELECTRON DIFFRACTION
ELECTRON MICROSCOPY
ELECTRONIC CIRCUITS
ELEMENTS
EPITAXY
ETCHING
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GERMANIUM
HETEROJUNCTIONS
INTEGRATED CIRCUITS
JUNCTIONS
LAYERS
LINE DEFECTS
LUMINESCENCE
METALS
MICROELECTRONIC CIRCUITS
MICROSCOPY
MOLECULAR BEAM EPITAXY
OPTICAL PROPERTIES
PHOTOLUMINESCENCE
PHYSICAL PROPERTIES
PNICTIDES
SCATTERING
SEMICONDUCTOR JUNCTIONS
SEMIMETALS
SILICON
SURFACE COATING
SURFACE FINISHING
SURFACES
TRANSMISSION ELECTRON MICROSCOPY
360601* -- Other Materials-- Preparation & Manufacture
ARSENIC COMPOUNDS
ARSENIDES
COHERENT SCATTERING
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
DEPOSITION
DIFFRACTION
DISLOCATIONS
ELECTRICAL PROPERTIES
ELECTRON DIFFRACTION
ELECTRON MICROSCOPY
ELECTRONIC CIRCUITS
ELEMENTS
EPITAXY
ETCHING
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GERMANIUM
HETEROJUNCTIONS
INTEGRATED CIRCUITS
JUNCTIONS
LAYERS
LINE DEFECTS
LUMINESCENCE
METALS
MICROELECTRONIC CIRCUITS
MICROSCOPY
MOLECULAR BEAM EPITAXY
OPTICAL PROPERTIES
PHOTOLUMINESCENCE
PHYSICAL PROPERTIES
PNICTIDES
SCATTERING
SEMICONDUCTOR JUNCTIONS
SEMIMETALS
SILICON
SURFACE COATING
SURFACE FINISHING
SURFACES
TRANSMISSION ELECTRON MICROSCOPY