Sputtering in surface conversion negative ion sources

Conference · Mon Oct 05 04:00:00 EDT 1992 · AIP Conference Proceedings (American Institute of Physics); (United States)

OSTI ID:6699471

Heeren, R M.A. ^[1]; de Graaf, M J ^[2]; Meyler, D B; Ciric, D; Hopman, H J; Kleyn, A W ^[3]

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1. FOM-Institute for Atomic- and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam ,The (Netherlands)
2. Technical University of Eindhoven, Department of Physics, P. O. Box 513, 5600 MB Eindhoven (Netherlands)
3. FOM-Institute for Atomic- and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam (Netherlands)

In negative ion surface conversion sources with barium converters sputtering of hydrogenous surface particles is believed to be the dominant negative ion production mechanism. In the work performed at the FOM-Institute ion sputtering is also used as cleaning and diagnostic tool. This paper will review the work related to the sputtering mechanisms applied in the FOM surface conversion experiment over the last years. It will be shown that not only sputtering but also direct reflection and prompt rebound sputtering contribute to the negative ion formation on a barium surface.

• OSTI ID: 6699471
• Report Number(s): CONF-921145--
• Conference Information: Journal Name: AIP Conference Proceedings (American Institute of Physics); (United States) Journal Volume: 287:1
• Country of Publication: United States
• Language: English

Related Subjects

661220* -- Particle Beam Production & Handling
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKALINE EARTH METALS
ANIONS
BARIUM
BEAMS
CATIONS
CHARGED PARTICLES
DEUTERIUM IONS
ELEMENTS
HYDROGEN IONS
HYDROGEN IONS 1 MINUS
HYDROGEN IONS 1 PLUS
ION BEAMS
ION SOURCES
IONIZATION
IONS
METALS
SPUTTERING
SURFACE IONIZATION
Ta
Targets-- (1992-)