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Enhanced columnar structure in CsI layer by substrate patterning

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6686436
; ; ; ; ; ;  [1];  [2]
  1. Lawrence Berkeley Lab., CA (United States)
  2. Xerox Palo Alto Research Center, CA (United States)
This paper reports on columnar structure in evaporated CsI layers which can be controlled by patterning substrates as well as varying evaporation conditions. Mesh-patterned substrates with various dimensions were created by spin-coating polyimide on glass or amorphous silicon substrates and defining patterns with standard photolithography technique. CsI(TI) layers 200-1000 [mu]m were evaporated. Scintillation properties of these evaporated layers, such as light yield and speed, were equivalent to those of the source materials. Spatial resolution of x-ray detectors consisting of these layers and a linear array of Si photodiodes was evaluated by exposing them to a 25 [mu]m narrow beam of X-ray.
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6686436
Report Number(s):
CONF-911106--
Conference Information:
Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 39:5
Country of Publication:
United States
Language:
English

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