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Investigation of deep level defects in epitaxial semiconducting zinc sulpho-selenide. Progress report, June 15, 1980-June 14, 1981

Technical Report ·
DOI:https://doi.org/10.2172/6653403· OSTI ID:6653403
High conductivity ZnSe single crystalline films have been heteroepitaxially deposited on GaAs substrates using open tube chemical vapor transport. Unintentionally doped films had net donor densities of 10/sup 14/ - 10/sup 16/ cm/sup -3/ and resistivities of 1 to 10/sup 3/ ohm cm. Resistivity was found to be strongly dependent upon zinc partial pressure during deposition. Electron mobilities of the order of 50 to 200 cm/sup 2//V sec were observed which suggested that the films are highly compensated. Properties of the deep level defects in heteroepitaxially grown ZnSe have been investigated using transient capacitance spectroscopy. A series of electron traps were observed with activation energies of 0.33, 0.35, 0.42, 0.71 and 0.86 eV in Au/ZnSe Schottky diodes. Trap concentration ranged from 10/sup 12/ to 10/sup 14/ cm/sup -3/ and depended on the zinc partial pressure. A model for the defect structure of ZnSe was proposed. Growth studies of ZnS/sub x/Se/sub 1-x/ on GaAs were begun.
Research Organization:
Northwestern Univ., Evanston, IL (USA). Dept. of Materials Science and Engineering
DOE Contract Number:
AC02-79ER10390
OSTI ID:
6653403
Report Number(s):
DOE/ER/10390-2
Country of Publication:
United States
Language:
English