Laser-induced damage measurements with 266-nm pulses

Conference · Wed Jan 23 04:00:00 EST 1980

OSTI ID:6633130

Deaton, T F; Smith, W L

The results of a survey of laser-induced damage thresholds for optical components at 266 nm are reported. The thresholds were measured at two pulse durations--0.150 ns and 1.0 ns. The 30 samples tested include four commercial dielectric reflectors, three metallic reflectors, two anti-reflection films, a series of eight half-wave oxide and fluoride films, and twelve bare surfaces (fluoride crystals, silica, sapphire, BK-7 glass, CD*A and KDP). The 266-nm pulses were obtained by frequency-quadrupling a Nd:YAG, glass laser. Equivalent plane imagery and calorimetry were used to measure the peak fluence of each of the UV pulses with an accuracy of +- 15%; the uncertainty in the threshold determinations is typically +- 30%.

• Research Organization: California Univ., Livermore (USA). Lawrence Livermore Lab.
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6633130
• Report Number(s): UCRL-83304; CONF-7910101-3
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700208* -- Fusion Power Plant Technology-- Inertial Confinement Technology
DIELECTRIC MATERIALS
ELECTROMAGNETIC RADIATION
ELEMENTS
GLASS
LASER RADIATION
MATERIALS
METALS
MIRRORS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RADIATIONS
REFLECTION
ULTRAVIOLET RADIATION
VISIBLE RADIATION