Damage thresholds of thin film materials and high reflectors at 248 nm

Conference · Thu Dec 31 23:00:00 EST 1981

OSTI ID:6014853

Rainer, F; Lowdermilk, W H; Milam, D; Carniglia, C K; Hart, T T; Lichtenstein, T L

Twenty-ns, 248-nm KrF laser pulses were used to measure laser damage thresholds for halfwave-thick layers of 15 oxide and fluoride coating materials, and for high reflectance coatings made with 13 combinations of these materials. The damage thresholds of the reflectors and single-layer films were compared to measurements of several properties of the halfwave-thick films to determine whether measurements of these properties of single-layer films to determine whether measurements of these properties of single-layer films were useful for identifying materials for fabrication of damage resistant coatings.

• Research Organization: Lawrence Livermore National Lab., CA (USA); Optical Coating Lab., Inc., Santa Rosa, CA (USA)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6014853
• Report Number(s): UCRL-89097; CONF-821194-1; ON: DE83012663
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
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700208 -- Fusion Power Plant Technology-- Inertial Confinement Technology
DEPOSITION
ELECTROMAGNETIC RADIATION
LASER RADIATION
OPTICAL PROPERTIES
OPTICAL SYSTEMS
PHYSICAL PROPERTIES
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RADIATIONS
REFRACTIVITY
SURFACE COATING
ULTRAVIOLET RADIATION