Scanning transmission electron microscopy/energy-dispersive X-ray analysis of metal fusible links in programmable read only memory integrated circuits

Journal Article · Sun Jan 01 00:00:00 EST 1984 · Scanning Electron Microsc.; (United States)

OSTI ID:6606252

Stacy, W T; Ritz, K N; Norcott, M H

Evaporated Ni-Cr and sputtered Ti-W-N fusible links have been analyzed before and after programming. STEM analysis allows the fuse to be examined without the removal of passivation layers and provides the resolution necessary to examine material in the fuse gap. STEM/EDX probing has revealed a Ti-rich residue in the fuse gap and W-rich droplets at the gap edge in the Ti-W-N fuses. Vertical sections have revealed a variation in the Ni-/Cr ratio as a function of the film depth with a Ni-rich region at the upper surface and a Cr-rich zone at the lower surface.

• Research Organization: Philips Research Labs., Signetics Corp., Sunnyvale, CA 94086
• OSTI ID: 6606252
• Journal Information: Scanning Electron Microsc.; (United States), Vol. 000084:2
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
42 ENGINEERING
99 GENERAL AND MISCELLANEOUS//MATHEMATICS, COMPUTING, AND INFORMATION SCIENCE
CHROMIUM
SCANNING ELECTRON MICROSCOPY
TRANSMISSION ELECTRON MICROSCOPY
X-RAY EMISSION ANALYSIS
INTEGRATED CIRCUITS
QUANTITATIVE CHEMICAL ANALYSIS
MEMORY DEVICES
NICKEL
TITANIUM
TUNGSTEN
DROPLETS
EVAPORATION
FILMS
LAYERS
PASSIVATION
PROGRAMMING
RESOLUTION
SPUTTERING
CHEMICAL ANALYSIS
ELECTRON MICROSCOPY
ELECTRONIC CIRCUITS
ELEMENTS
METALS
MICROELECTRONIC CIRCUITS
MICROSCOPY
NONDESTRUCTIVE ANALYSIS
PARTICLES
PHASE TRANSFORMATIONS
TRANSITION ELEMENTS
400101* - Activation
Nuclear Reaction
Radiometric & Radiochemical Procedures
420800 - Engineering- Electronic Circuits & Devices- (-1989)
990220 - Computers
Computerized Models
& Computer Programs- (1987-1989)