Silicon nitride coatings on molybdenum by rf reactive ion plating
Rf reactive ion plating technique was applied to the preparation of protective silicon nitride coating on molybdenum. All the deposits prepared at deposition temperature of less than 1000/sup 0/C were amorphous. Silicon in deposits was found to be present as nitride by Auger electron spectroscopic, infrared absorption spectroscopic, and x-ray diffraction analyses. Nearly stoichiometric silicon nitride deposits were obtained at a deposition rate of as high as 1 ..mu..m/min. Several factors affecting the stoichiometry of the silicon nitride were discussed. Oxidation test of the coated specimens showed that the silicon nitride layer obtained under optimum conditions protected the molybdenum substrate from oxidation in Ar--1% O/sub 2/ gas mixtures up to approximately 1200/sup 0/C. Typical pitting corrosion was observed in the coating film at the higher temperatures. 8 figures, 2 tables.
- Research Organization:
- National Research Inst. for Metals, Tokyo, Japan
- OSTI ID:
- 6604335
- Journal Information:
- J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 124:9; ISSN JESOA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360105* -- Metals & Alloys-- Corrosion & Erosion
ABSORPTION SPECTROSCOPY
AMORPHOUS STATE
ARGON
AUGER ELECTRON SPECTROSCOPY
CHEMICAL REACTIONS
COATINGS
COHERENT SCATTERING
CORROSION
CRYOGENIC FLUIDS
DEPOSITION
DIFFRACTION
ELECTRON SPECTROSCOPY
ELEMENTS
FILMS
FLUIDS
METALS
MOLYBDENUM
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
OXIDATION
OXYGEN
PITTING CORROSION
PLATING
PNICTIDES
PROTECTIVE COATINGS
RARE GASES
REFRACTORY METALS
SCATTERING
SILICON COMPOUNDS
SILICON NITRIDES
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENTS
VERY HIGH TEMPERATURE
X-RAY DIFFRACTION