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Title: Structural characterization of the thermal evolution of tetrahedrally coordinated amorphous carbon films

Conference ·
OSTI ID:658198
 [1]; ; ;  [2];  [3]
  1. Univ. of Maryland, College Park, MD (United States). Dept. of Materials and Nuclear Engineering
  2. Sandia National Labs., Albuquerque, NM (United States)
  3. Drexel Univ., Philadelphia, PA (United States). Dept. of Physics and Atmospheric Sciences

The authors present the results of a post-deposition annealing structural study on amorphous tetrahedrally-coordinated carbon (a-tC) films on Si(100) prepared by pulsed-laser deposition. Films as-deposited and post-annealed at 200, 300, 400, 500 and 600 C, respectively, are studied using combined X-ray reflectivity and low-angle scattering measurements. The scans are fit to the Fresnel equations to obtain values for average film density, film and interface thickness, and film and interface roughness. They observe a correlation between the evolution of film density, roughness and the spacing of quasi-periodic structures in the films as a function of annealing temperature. They relate the evolution of these structural features with previous measurements of the resistivity and the observed stress release in these films.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
658198
Report Number(s):
SAND-97-1671C; CONF-971201-; ON: DE98005640; BR: DP0301010; TRN: AHC2DT06%%82
Resource Relation:
Conference: 1997 fall meeting of the Materials Research Society, Boston, MA (United States), 1-5 Dec 1997; Other Information: PBD: Dec 1997
Country of Publication:
United States
Language:
English