Structural characterization of the thermal evolution of tetrahedrally coordinated amorphous carbon films
- Univ. of Maryland, College Park, MD (United States). Dept. of Materials and Nuclear Engineering
- Sandia National Labs., Albuquerque, NM (United States)
- Drexel Univ., Philadelphia, PA (United States). Dept. of Physics and Atmospheric Sciences
The authors present the results of a post-deposition annealing structural study on amorphous tetrahedrally-coordinated carbon (a-tC) films on Si(100) prepared by pulsed-laser deposition. Films as-deposited and post-annealed at 200, 300, 400, 500 and 600 C, respectively, are studied using combined X-ray reflectivity and low-angle scattering measurements. The scans are fit to the Fresnel equations to obtain values for average film density, film and interface thickness, and film and interface roughness. They observe a correlation between the evolution of film density, roughness and the spacing of quasi-periodic structures in the films as a function of annealing temperature. They relate the evolution of these structural features with previous measurements of the resistivity and the observed stress release in these films.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 658198
- Report Number(s):
- SAND--97-1671C; CONF-971201--; ON: DE98005640; BR: DP0301010
- Country of Publication:
- United States
- Language:
- English
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