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U.S. Department of Energy
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Physical sputtering of candidate plasma-side materials for FED/INTOR

Technical Report ·
DOI:https://doi.org/10.2172/6567910· OSTI ID:6567910
Physical sputtering data are reviewed for a variety of candidate plasma-side materials for fusion reactor applications. Normal incidence sputtering yields are presented for both light and heavy ions (including H, D /sup 4/He, and self-ions) on Be, B, C, SiC, TiC, V, stainless steel, Mo and W targets for energies ranging from the sputtering threshold up to 10 keV and higher. The available data are compared with model calculations for H, D, T, /sup 4/He, and self-ion sputtering of the candidate materials. The influence of angle of incidence, surface composition and morphology, and target temperature is discussed. The sputtering of multi-component targets and the energy and angular distributions of sputtered atoms are also considered. It is found that the existing data and models are adequate for factor-of-two estimates of physical sputtering yields for most of the relevant energies and ion-target combinations.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6567910
Report Number(s):
ORNL/TM-8593; ON: DE83005171
Country of Publication:
United States
Language:
English