Excimer laser photochemistry of silane-ammonia mixtures at 193 nm

Journal Article · Thu Apr 05 04:00:00 EDT 1990 · Journal of Physical Chemistry; (USA)

DOI:https://doi.org/10.1021/j100370a053· OSTI ID:6551600

Beach, D B; Jasinski, J M ^[1]

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1. Thomas J. Watson Research Center, Yorktown Heights, NY (USA)

The ArF excimer laser induced photochemistry of silane-ammonia mixtures has been studied with molecular beam sampling mass spectrometry. The observed products include disilane, trisilane, and all possible aminosilanes, SiH{sub x}(NH{sub 2}){sub 4-x}, x = 0-3. These products are formed under steady-state photolysis conditions and under single-laser-pulse conditions. A mechanism for the formation of these species is proposed and quantitatively evaluated.

• OSTI ID: 6551600
• Journal Information: Journal of Physical Chemistry; (USA), Journal Name: Journal of Physical Chemistry; (USA) Vol. 94:7; ISSN 0022-3654; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
AMMONIA
CHEMISTRY
DATA
DATA ANALYSIS
DIELECTRIC MATERIALS
EXCIMER LASERS
EXPERIMENTAL DATA
FABRICATION
FILMS
GAS LASERS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
LASERS
MATERIALS
MEASURING INSTRUMENTS
MEASURING METHODS
NITROGEN COMPOUNDS
NITROGEN HYDRIDES
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOCHEMISTRY
SILANES
SILICON COMPOUNDS
THIN FILMS