Doping of GaN by ion implantation: Does It Work?
- Univ. of North Carolina, Chapel Hill, NC (United States)
- Oak Ridge National Lab., TN (United States)
- North Carolina State Univ., Raleigh, NC (United States)
- Implant Center, San Jose, CA (United States)
Epitaxially grown GaN by metal organic chemical vapor deposition (MOCVD) on SiC were implanted with 100 keV Si{sup +} (for n-type) and 80 keV Mg{sup +} (for p-type) with various fluences from 1 {times} 10{sup 12} to 7 {times} 10 {sup 15} ions/cm{sup 2} at liquid nitrogen temperature (LT), room temperature (RT), and 700 C (HT). High temperature (1,200 C and 1,500 C) annealing was carried out after capping the GaN with epitaxial AlN by MOCVD to study damage recovery. Samples were capped by a layer of AlN in order to protect the GaN surface during annealing. Effects of implant temperature, damage and dopant activation are critically studied to evaluate a role of ion implantation in doping of GaN. The damage was studied by Rutherford Backscattering/Channeling, spectroscopic ellipsometry and photoluminescence. Results show dependence of radiation damage level on temperature of the substrate during implantation: implantations at elevated temperatures up to 550 C decrease the lattice disorder; hot implants above 550 C can not be useful in doping of GaN due to nitrogen loss from the surface. SE measurements have indicated very high sensitivity to the implantation damage. PL measurements at LT of 80 keV Mg{sup +} (5 {times} 10{sup 14} cm{sup 2}) implanted and annealed GaN showed two peaks: one {approximately} 100 meV and another {approximately} 140 meV away from the band edge.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States); Southeastern Universities Research Association, Inc., Newport News, VA (United States); Oak Ridge Associated Universities, Inc., TN (United States); Oak Ridge National Lab., TN (United States)
- DOE Contract Number:
- AC05-96OR22464
- OSTI ID:
- 654192
- Report Number(s):
- ORNL/CP--98016; CONF-980405--; ON: DE98005655; BR: KC0201040
- Country of Publication:
- United States
- Language:
- English
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