Josephson tunnel junctions on niobium films
Technical Report
·
OSTI ID:6513758
A method of fabricating stable Josephson tunnel junctions with reproducible characteristics is described. The junctions have a sandwich structure consisting of a vacuum evaporated niobium film, a niobium oxide layer produced by the glow discharge method, and a lead film deposited by vacuum evaporation. Difficulties in producing thin-film Josephson junctions are discussed. Experimental results suggest that the lower critical field of the niobium film is the most essential parameter when evaluating the quality of these junctions. The dependence of the lower critical field on the film thickness and on the Ginzburg-Landau parameter of the film is studied analytically. Comparison with the properties of the evaporated films and with the previous calculations for bulk specimens shows that the presented model is applicable for most of the prepared samples.
- Research Organization:
- Valtion Teknillinen Tutkimuskeskus, Espoo (Finland)
- OSTI ID:
- 6513758
- Report Number(s):
- N-78-17911; VTT-ENT-17
- Country of Publication:
- United States
- Language:
- English
Similar Records
Fabrication and tunneling properties of niobium/lead Josephson junctions
New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodes
Niobium thin-film Josephson junctions using a semiconductor barrier
Thesis/Dissertation
·
Mon Dec 31 23:00:00 EST 1984
·
OSTI ID:5468710
New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodes
Journal Article
·
Tue Nov 30 23:00:00 EST 1982
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6719077
Niobium thin-film Josephson junctions using a semiconductor barrier
Journal Article
·
Sun Dec 31 23:00:00 EST 1972
· Journal of Applied Physics
·
OSTI ID:4315152