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Vaporization thermodynamics and kinetics of hexagonal silicon carbide

Conference ·
OSTI ID:6511151
Mass spectrometer Knudsen effusion vaporization measurements over the temperature range 1835 to 2264K confirm earlier mass spectrometer results that Si(g) is the predominant vapor species above the SiC-C two-phase region. Si/sub 2/C(g) and SiC/sub 2/(g) are found to be the next most important vapor species. Total vapor pressures are measured to be a factor of 10 to 15 higher than values previously reported between 1800 to 2200K. Silicon partial pressures lead to a value of -7.5 kcal mol/sup -1/ for the enthalpy of formation of Sic(hexagonal) at 298K. Partial pressures of Si(g), SiC/sub 2/(g), and Si/sub 2/C(g) lead to third-law enthalpies of formation for SiC/sub 2/(g) and Si/sub 2/C(g) which are in accord with previously recommended values. Langmuir vaporization of SiC(hexagonal) (0001) single crystal faces in the mass spectrometer show ion intensities of Si/sup +/ and SiC/sub 2//sup +/ that are time-independent after an initial induction period during which the intensities increase by a factor of 1.5 before attaining steady-state value. The mass spectrometer studies between 2200 to 2500K give activation enthalpies of ..delta..H*(2350) = 141.6 +- 2.7 kcal mol/sup -1/ for Si(g) and ..delta..H*(2350) = 166.2 +- 3.5 kcal mol/sup -1/ for SiC/sub 2/(g) vaporization from the (0001) crystal face of hexagonal SiC. Constant temperature total mass-loss Langmuir vaporization experiments using SiC (0001) crystal faces show a time-dependent rate of mass-loss. It is believed that this time-dependent behavior is caused by a decrease in the SiC(hexagonal) single crystal surface area and is not due to impedance of silicon vaporization by the graphite layer formed on the crystal surface during decomposition.
Research Organization:
Los Alamos Scientific Lab., NM (USA)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
6511151
Report Number(s):
LA-UR-78-2102; CONF-780941-2
Country of Publication:
United States
Language:
English